PVD sputtering to produce faster and smaller transistors for high-resolution displays requires high deposition uniformity over large substrate areas. Control of vacuum conditions is critical in this process. VAT vacuum valve solutions offer highly precise control capabilities even at very low conductance levels and reliable high-frequency isolation while maximizing particle activation avoidance.
To learn more about how a VAT vacuum valve solution can solve sputter application challenges, please select from the products listed below.
